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Influence of block copolymer feature size on reactive ion etching pattern transfer into silicon

Dialameh M., Ferrarese Lupi F., Imbraguglio D., Zanenga F., Lamperti A., Martella D., Seguini G., Perego M., Rossi A.M., De Leo N., Boarino L.

block copolymers, reactive ion etching, self-assembly, cryogenic RIE, holey silicon

Document type Article
Journal title / Source Nanotechnology
Volume 28
Issue 40
Page numbers / Article number 404001
Publisher's name IOP Publishing
Publication date 2017-9-12
ISSN 0957-4484, 1361-6528
DOI 10.1088/1361-6528/aa8144
Language English

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Project title (JRP)
14IND01: 3DMetChemIT: Advanced 3D chemical metrology for innovative technologies
Name of Call / Funding Programme
EMPIR 2014: Industry