4-Nitrobenzene Grafted in Porous Silicon: Application to Optical Lithography
Tiddia M.V., Mula G., Sechi E., Vacca A., Cara E., De Leo N., Fretto M., Boarino L.Porous silicon, Optical lithography, 4-Nitrobenzenediazonium, grafting, Improved chemical resistance
| Document type | Article |
| Journal title / Source | Nanoscale Research Letters |
| Volume | 11 |
| Issue | 436 |
| Page numbers / Article number | 1-10 |
| Publisher's name | SpringerOpen |
| Publisher's address (city only) | London |
| Publication date | 2016-9-29 |
| ISSN | 1556-276X |
| DOI | 10.1186/s11671-016-1654-8 |
| Web URL | https://nanoscalereslett.springeropen.com/articles/10.1186/s11671-016-1654-8 |
| Language | English |