Characterization of Semiconductor Materials using Synchrotron Radiation-based Near-Field Infrared Microscopy and nano-FTIR Spectroscopy
Hermann PH, Hoehl AH, Ulrich GU, Fleischmann CF, Hermelink AH, Kästner BK, Patoka PP, Hornemann AH, Beckhoff BB, Rühl ER, Ulm GUInstrumentation, measurement, and metrology, Near-field microscopy, Optics at surfaces, Spectroscopy, Thin films, optical properties
Document type | Article |
Journal title / Source | Optics Express |
Peer-reviewed article | 1 |
Volume | 22 |
Issue | 15 |
Page numbers / Article number | 17948-17958 |
Publisher's name | Optical Society of America (OSA) |
Publisher's address (city only) | Washington |
Publication date | 2014 |
ISSN | 1094-4087 |
DOI | 10.1364/OE.22.017948 |
Web URL | https://www.osapublishing.org/oe/abstract.cfm?uri=oe-22-15-17948 |
Language | English |