Characterization of Semiconductor Materials using Synchrotron Radiation-based Near-Field Infrared Microscopy and nano-FTIR Spectroscopy
Hermann PH, Hoehl AH, Ulrich GU, Fleischmann CF, Hermelink AH, Kästner BK, Patoka PP, Hornemann AH, Beckhoff BB, Rühl ER, Ulm GUInstrumentation, measurement, and metrology, Near-field microscopy, Optics at surfaces, Spectroscopy, Thin films, optical properties
| Document type | Article |
| Journal title / Source | Optics Express |
| Peer-reviewed article | 1 |
| Volume | 22 |
| Issue | 15 |
| Page numbers / Article number | 17948-17958 |
| Publisher's name | Optical Society of America (OSA) |
| Publisher's address (city only) | Washington |
| Publication date | 2014 |
| ISSN | 1094-4087 |
| DOI | 10.1364/OE.22.017948 |
| Web URL | https://www.osapublishing.org/oe/abstract.cfm?uri=oe-22-15-17948 |
| Language | English |