Characterization of Semiconductor Materials using Synchrotron Radiation-based Near-Field Infrared Microscopy and nano-FTIR Spectroscopy

Hermann PH, Hoehl AH, Ulrich GU, Fleischmann CF, Hermelink AH, Kästner BK, Patoka PP, Hornemann AH, Beckhoff BB, Rühl ER, Ulm GU

Instrumentation, measurement, and metrology, Near-field microscopy, Optics at surfaces, Spectroscopy, Thin films, optical properties

Document type Article
Journal title / Source Optics Express
Peer-reviewed article 1
Volume 22
Issue 15
Page numbers / Article number 17948-17958
Publisher's name Optical Society of America (OSA)
Publisher's address (city only) Washington
Publication date 2014
ISSN 1094-4087
DOI 10.1364/OE.22.017948
Language English

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