Supplementary Comparison: Nano1 SC on structure width measurements

Project Description

The Nano1 project aims to carry out an international comparison of linewidth measurements on chrome-on-glass photomasks among 11 national metrology institutes.

The object to be measured is a 40 mm × 40 mm × 6.35 mm die, which was diced from a state-of-the-art 6025-format photomask. Isolated lines and trenches ranging from 100 nm to 50 μm, as well as dense structures from 100 nm to 5 μm, will be measured using optical microscopy (CD-OM), electron microscopy (CD-SEM), or force microscopy (CD-AFM).

The project focuses on assessing measurement comparability and will contribute to determining the metrological equivalence of national measurement standards, while also addressing the strong demand for bidirectional calibrations in semiconductor manufacturing.