Pilot Study: Comparison of material characterisation for semiconductors using resonators, free-space, and on-wafer techniques

Project Description:

This pilot study is part of the European Partnership on Metrology (EPM) project 23IND10 OnMicro, which focuses on developing accurate methods for measuring material properties (i.e., permittivity and loss tangent) for different types of materials including semiconductors, thin-films, and novel 2D materials.

The measurement techniques employed include resonators, MCKs, free-space methods, and on-wafer techniques.

In this pilot study, at least two reference materials suitable for measurement using all these techniques will be evaluated.
The measurement results will be analysed, compared, and documented in a report.

METAS (Switzerland) and CMI (Czechia) will contributing to the extraction process and data analysis, but will not carry out measurements.

The technical protocol can be downloaded here>>