Metrology for Airborne Molecular Contaminants II

Short Name: MetAMCII, Project Number: 17IND09
Image showing engineer in sterile coverall holding microchip with gloves and examining it
In ultra modern electronic manufacturing factory design engineer in sterile coverall holds microchip with gloves and examines it

Accurately measuring Airborne Molecular Contamination in the semiconductor production process

European semiconductor sales amount to approximately €32 billion per year, representing 10 % of the global share. Progress is driven by the ability to operate at increasingly smaller scales and with greater complexity. A key challenge facing the industry is production loss due to Airborne Molecular Contamination (AMC) in the form of vapours and aerosols, which can corrode metal surfaces and form contamination layers during microscale manufacturing processes. Existing monitoring instrumentation is often deficient, and since 1997 there have been 24 major production losses due to AMC, each with a value of up to €80 million.


This project has developed new spectroscopic techniques and reference materials to measure priority AMCs (HCl and NH3) at lower concentrations (<1 nmol/mol) and faster rates (<1 minute), than is currently possible. It also investigated typical AMC monitoring scenarios and improve system robustness and transportability. By developing techniques for timely and reliable AMC detection, this project has enabled semiconductor manufacturers to make corrective actions before production yields are affected.


This project builds on from EMRP project IND63 MetAMC.


Project website
Other Participants
Gasera Oy (Finland)
Optoseven Oy (Finland)
Politecnico di Torino (Italy)