Towards Quantum Resistance Metrology Based on Graphene
Ahlers F., Kučera J., Poirier W., Jeanneret B., Satrapinski A., Tzalenchuk A., Vrabček P., Bergsten T., Hwang C., Yakimova R., Kubatkin S.Measurement standards, resistance, quantum hall effect, graphene, C, Calibration, EMRP project GraphOhm, Electrical resistance measurement, Hall effect devices, JRP, Materials, Metrology, Resistance, Standards, electric resistance measurement, electrical measurement, intrinsically referenced resistance standard disse, joint research project, quantum resistance metrology standard, semiconductor quantum Hall device
| Document type | Proceedings |
| Journal title / Source | The EMRP Project GraphOhm - Towards Quantum Resistance Metrology Based on Graphene |
| Page numbers / Article number | 548-549 |
| Publisher's name | IEEE |
| Publication date | 2014 |
| Conference date | 24-29 Aug. 2014 |
| Conference place | Rio de Janeiro |
| ISSN | 0589-1485 |
| DOI | 10.1109/CPEM.2014.6898502 |
| ISBN | 978-1-4799-2479-0 |
| Web URL | http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=6898502 |
| Language | English |