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Surface Layer Analysis of Si Sphere by XRF and XPS

Zhang L. Z., Azuma Y. A., Kurokawa A. K., Kuramoto N. K., Fujii K. F.
Keywords:

Chemical analysis, silicon, surface contamination, thickness measurement, X-ray spectroscopy

Document type Article
Journal title / Source IEEE Transaction on Instrumentation and Measurement
Peer-reviewed article 1
Volume 64
Issue 6
Page numbers / Article number 1509-1513
Publisher's name Institution of Electrical and Electrical Engineering (IEEE)
Publisher's address (city only) Piscataway
Publication date 2015-2-2
ISSN 0018-9456
DOI 10.1109/TIM.2015.2389352
Web URL http://ieeexplore.ieee.org/xpl/abstractAuthors.jsp?arnumber=7029043&refinements%3D4294557292%26filter%3DAND%28p_IS_Number%3A7104190%29
Language English
Persistent Identifier INSPEC Accession Number: 15111454

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Information

Project title (JRP)
SIB03: kNOW Realisation of the awaited definition of the kilogram - resolving the discrepancies
Name of Call / Funding Programme
EMRP A169: Call 2011 SI Broader Scope