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Surface Layer Analysis of Si Sphere by XRF and XPS

Zhang L. Z., Azuma Y. A., Kurokawa A. K., Kuramoto N. K., Fujii K. F.

Chemical analysis, silicon, surface contamination, thickness measurement, X-ray spectroscopy

Document type Article
Journal title / Source IEEE Transaction on Instrumentation and Measurement
Peer-reviewed article 1
Volume 64
Issue 6
Page numbers / Article number 1509-1513
Publisher's name Institution of Electrical and Electrical Engineering (IEEE)
Publisher's address (city only) Piscataway
Publication date 2015-2-2
ISSN 0018-9456
DOI 10.1109/TIM.2015.2389352
Language English
Persistent Identifier INSPEC Accession Number: 15111454

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Project title (JRP)
SIB03: kNOW Realisation of the awaited definition of the kilogram - resolving the discrepancies
Name of Call / Funding Programme
EMRP A169: Call 2011 SI Broader Scope