Surface Layer Analysis of Si Sphere by XRF and XPS
Zhang L. Z., Azuma Y. A., Kurokawa A. K., Kuramoto N. K., Fujii K. F.Chemical analysis, silicon, surface contamination, thickness measurement, X-ray spectroscopy
| Document type | Article |
| Journal title / Source | IEEE Transaction on Instrumentation and Measurement |
| Peer-reviewed article | 1 |
| Volume | 64 |
| Issue | 6 |
| Page numbers / Article number | 1509-1513 |
| Publisher's name | Institution of Electrical and Electrical Engineering (IEEE) |
| Publisher's address (city only) | Piscataway |
| Publication date | 2015-2-2 |
| ISSN | 0018-9456 |
| DOI | 10.1109/TIM.2015.2389352 |
| Web URL | http://ieeexplore.ieee.org/xpl/abstractAuthors.jsp?arnumber=7029043&refinements%3D4294557292%26filter%3DAND%28p_IS_Number%3A7104190%29 |
| Language | English |
| Persistent Identifier | INSPEC Accession Number: 15111454 |