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Influence of block copolymer feature size on reactive ion etching pattern transfer into silicon

Dialameh, M., Ferrarese Lupi, F. (Laboratorio MDM, INM-CNR, Brianza, Italy), Imbraguglio, D., Zanenga, F., Lamperti, A., Martella, D., Seguini, G. (IMM-CNR), Perego, M. (Laboratorio MDM, IMM-CNR), Rossi, A.M., De Leo, N. and Boarino, L. (Istituto Nazionale di Ricerca Metrologica (INRiM))
Keywords:

block copolymers, reactive ion etching, self-assembly, cryogenic RIE, holey silicon

Document typeArticle
Journal title / SourceNanotechnology
Volume28
Issue40
Page numbers / Article number404001
Publisher's nameIOP Publishing
Publication date 2017-09-12
ISSN0957-4484, 1361-6528
DOI10.1088/1361-6528/aa8144
Web URLhttp://iopscience.iop.org/article/10.1088/1361-6528/aa8144
LanguageEnglish

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