Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle
Soltwisch V., Burger S., Scholze F.EUV scatterometry, horizontal and vertical di raction, optical metrology, computational lithography, finite-element methods
| Document type | Proceedings |
| Journal title / Source | Proc SPIE |
| Volume | 8789 |
| Publication date | 2015 |
| Conference name | SPIE Modelling Aspects in Optical Metrology IV |
| Conference date | May 13, 2013 |
| Conference place | Munich, Germany |
| DOI | 10.1117/12.2020487 |
| Language | English |