AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure
Heikkinen I.T.S., Koutsourakis G. , Virtanen S., Yli-Koski M., Wood S., Vähänissi V., Salmi E., Castro F.A., Savin H.Spatial Atomic Layer Deposition, aluminum oxide, surface passivation, light soaking, damp heat
Document type | Article |
Journal title / Source | Journal of Vacuum Science & Technology A |
Volume | 38 |
Issue | 2 |
Page numbers / Article number | 022401 |
Publisher's name | American Vacuum Society |
Publication date | 2020-3 |
ISSN | 0734-2101, 1520-8559 |
DOI | 10.1116/1.5133896 |
Language | English |