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AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure

Heikkinen I.T.S., Koutsourakis G. , Virtanen S., Yli-Koski M., Wood S., Vähänissi V., Salmi E., Castro F.A., Savin H.
Keywords:

Spatial Atomic Layer Deposition, aluminum oxide, surface passivation, light soaking, damp heat

Document type Article
Journal title / Source Journal of Vacuum Science & Technology A
Volume 38
Issue 2
Page numbers / Article number 022401
Publisher's name American Vacuum Society
Publication date 2020-3
ISSN 0734-2101, 1520-8559
DOI 10.1116/1.5133896
Language English

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Information

Project title (JRP)
16ENG03: HyMet: Hybrid metrology for thin films in energy applications
Name of Call / Funding Programme
EMPIR 2016: Energy