Impact of Line Edge Roughness on ReRAM Uniformity and Scaling

Constantoudis V., Papavieros G., Karakolis P., Khiat A., Prodromakis T., Korpelainen V., Dimitrakis P.

Resistive Random Access Memory (ReRAM); Line Edge Roughness (LER); variability; uniformity; modeling; lithography

Document type Article
Journal title / Source Materials
Volume 12
Issue 23
Page numbers / Article number 3972
Publisher's name MDPI AG
Publication date 2019-11
ISSN 1996-1944
DOI 10.3390/ma12233972
Language English

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