Optical characterisation of patterned thin films
Rosu DR, Petrik PP, Rattmann GR, Schellenberger MS, Beck UB, Hertwig AHSpectroscopic imaging and mapping ellipsometry, Inhomogeneous and patterned thin films, SiO2, Photoresist
| Document type | Article |
| Journal title / Source | Thin Solid Films |
| Peer-reviewed article | 1 |
| Volume | 571 |
| Issue | 3 |
| Page numbers / Article number | 601-604 |
| Publisher's name | Elsevier |
| Publisher's address (city only) | Amsterdam, Netherlands |
| Publication date | 2014-11-28 |
| ISSN | 0040-6090 |
| DOI | 10.1016/j.tsf.2013.11.052 |
| Web URL | http://www.sciencedirect.com/science/article/pii/S0040609013019056 |
| Language | English |