Nanometrology on Gratings with GISAXS: FEM Reconstruction and Fourier Analysis
Soltwisch V., Wernecke J., Haase A., Probst J., Schoengen M., Krumrey M., Scholze F.optical metrology, computational lithography, nite element method, grazing incidence scatterometry, electron beam lithography, Fourier transformation
| Document type | Proceedings |
| Journal title / Source | Proc SPIE |
| Publication date | 2015 |
| Conference name | SPIE Metrology, Inspection, and Process Control for Microlithography XXVII |
| Conference date | February 23, 2014 |
| Conference place | San Jose, California, United States |
| DOI | 10.1117/12.2046212 |
| Language | English |