Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and Tilting-AFM
Gaoliang D., Hahm K., Scholze F., Henn M.-A., Gross H., Fluegge J., Bosse H.EUV-lithography, photomask, CD, sidewall angle, feature height, CD-AFM, Tilting-AFM, scatterometry, traceability
| Document type | Article |
| Journal title / Source | Meas. Sci. Technol. |
| Peer-reviewed article | 1 |
| Volume | 25 |
| Publication date | 2014-3-5 |
| DOI | 10.1088/0957-0233/25/4/044002 |
| Web URL | http://iopscience.iop.org/0957-0233/25/4/044002 |
| Language | English |