Mueller matrix ellipsometry for enhanced optical form metrology of sub-lambda structures
Käseberg T., Dickmann J., Siefke T., Wurm M., Kroker S., Bodermann B.Plasmonics, Ellipsometry, Scanning electron microscopy, Numerical simulations, Metrology, Nanostructures, Near field optics
| Document type | Proceedings |
| Journal title / Source | Modeling Aspects in Optical Metrology VII |
| Volume | 11057 |
| Page numbers / Article number | 155-165 |
| Publisher's name | SPIE |
| Publication date | 2019-6-21 |
| Conference name | International Society for Optics and Photonics Optical Metrology |
| Conference date | 24-06-2019 to 27-06-2019 |
| Conference place | Munich |
| DOI | 10.1117/12.2527419 |
| Language | English |