Improved reconstruction of critical dimensions in exteme ultraviolet scatterometry by modellig systematic errors
Henn M-A, Gross H, Heidenreich S, Scholze F, Elster C, Bär MScatterometry, metrology, EUV-lithography
| Document type | Article |
| Journal title / Source | Measurement Science and Technology |
| Peer-reviewed article | 1 |
| Volume | 25 |
| Issue | 4 |
| Page numbers / Article number | 044003 (9pp) |
| Publisher's name | IOPScience |
| Publisher's address (city only) | Bristol & Philadelphia |
| Publication date | 2014-3-5 |
| ISSN | - |
| DOI | 10.1088/0957-0233/25/4/044003 |
| Web URL | http://iopscience.iop.org/article/10.1088/0957-0233/25/4/044003/meta |
| Language | English |