High Aspect Ratio PS‑b‑PMMA Block Copolymer Masks for Lithographic Applications
Ferrarese Lupi F., Giammaria T.J., Volpe F.G., Lotto F., Seguini G., Pivac B., Laus M., Perego M.block copolymer, self-assembly, nanolithography, high aspect-ratio, rapidt hermal processing, PS-b-PMMA
| Document type | Article |
| Journal title / Source | ACS Applied Materials & Interfaces |
| Peer-reviewed article | 1 |
| Volume | 6(23) |
| Issue | 2014 |
| Page numbers / Article number | 21389−21396 |
| Publisher's name | ACS Publications Ameican Chemical Society |
| Publisher's address (city only) | Washington |
| Publication date | 2014-11-11 |
| DOI | 10.1021/am506391n |
| Web URL | http://pubs.acs.org/doi/abs/10.1021/am506391n |
| Language | English |