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High Aspect Ratio PS‑b‑PMMA Block Copolymer Masks for Lithographic Applications

Ferrarese Lupi F., Giammaria T.J., Volpe F.G., Lotto F., Seguini G., Pivac B., Laus M., Perego M.

block copolymer, self-assembly, nanolithography, high aspect-ratio, rapidt hermal processing, PS-b-PMMA

Document type Article
Journal title / Source ACS Applied Materials & Interfaces
Peer-reviewed article 1
Volume 6(23)
Issue 2014
Page numbers / Article number 21389−21396
Publisher's name ACS Publications Ameican Chemical Society
Publisher's address (city only) Washington
Publication date 2014-11-11
DOI 10.1021/am506391n
Language English

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Project title (JRP)
SIB61: CRYSTAL: Crystalline surfaces, self assembled structures, and nano-origami as length standard in (nano)metrology
Name of Call / Funding Programme
EMRP A169: Call 2012 SI Broader scope (II)