High Aspect Ratio PS‑b‑PMMA Block Copolymer Masks for Lithographic Applications

Ferrarese Lupi F., Giammaria T.J., Volpe F.G., Lotto F., Seguini G., Pivac B., Laus M., Perego M.

block copolymer, self-assembly, nanolithography, high aspect-ratio, rapidt hermal processing, PS-b-PMMA

Document type Article
Journal title / Source ACS Applied Materials & Interfaces
Peer-reviewed article 1
Volume 6(23)
Issue 2014
Page numbers / Article number 21389−21396
Publisher's name ACS Publications Ameican Chemical Society
Publisher's address (city only) Washington
Publication date 2014-11-11
DOI 10.1021/am506391n
Web URL http://pubs.acs.org/doi/abs/10.1021/am506391n
Language English

Back to the list view