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SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions

Havelund, R. (NPL, National Physical Laboratory, Teddington, Middlesex, TW11 0LW, United Kingdom), Seah, M. P., Tiddia, M. and Gilmore, I. S.
Keywords:

SIMS

Document typeArticle
Journal title / SourceJournal of The American Society for Mass Spectrometry
Volume29
Issue4
Page numbers / Article number774-785
Publisher's nameSpringer US
Publication date 2018-02-21
ISSN1044-0305, 1879-1123
DOI10.1007/s13361-018-1905-2
Web URLhttps://link.springer.com/article/10.1007%2Fs13361-018-1905-2
LanguageEnglish

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