Development of a scatterometry reference standard
Bodermann B., Loechel B., Scholze F., Dai G., Wernecke J., Endres J., Probst J., Schoengen M., Krumrey M., Hansen P.-E., Soltwisch V.Scatterometry, CD metrology, traceability, reference standard, tool matching, AFM, SEM, rigorous modelling
| Document type | Proceedings |
| Journal title / Source | Proc SPIE |
| Volume | 9132 |
| Publication date | 2015 |
| Conference name | SPIE Optical Micro- and Nanometrology V |
| Conference date | April 14, 2014 |
| Conference place | Brussels, Belgium |
| DOI | 10.1117/12.2052278 |
| Language | English |