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4-Nitrobenzene Grafted in Porous Silicon: Application to Optical Lithography

Tiddia, M.V., Mula, G., Sechi, E., Vacca, A., Cara, E., De Leo, N., Fretto, M. and Boarino, L. (Istituto Nazionale di Ricerca Metrologica (INRiM))
Keywords:

Porous silicon, Optical lithography, 4-Nitrobenzenediazonium, grafting, Improved chemical resistance

Document typeArticle
Journal title / SourceNanoscale Research Letters
Volume11
Issue436
Page numbers / Article number1-10
Publisher's nameSpringerOpen
Publisher's address (city only)London
Publication date 2016-09-29
ISSN1556-276X
DOI10.1186/s11671-016-1654-8
Web URLhttps://nanoscalereslett.springeropen.com/articles/10.1186/s11671-016-1654-8
LanguageEnglish

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