Comparison of CD measurements of an EUV photomask by EUV scatterometry and CD-AFM

Scholze F., Soltwisch V., Dai G., Henn M.-A., Gross H.
Keywords:

mask metrology, EUV lithography, CD metrology, line edge roughness, line width roughness

Document type Proceedings
Journal title / Source Proc. of SPIE
Volume 8880
Publication date 2013-9-9
Conference name Photomask Technology 2013
Conference date September 10, 2013
Conference place Monterey, California, United States
DOI 10.1117/12.2025827
Web URL http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1736337
Language English

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