Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry

Petrik PP, Gumprecht TG, Nutsch AN, Roeder GR, Lemberger ML, Juhasz GJ, Polgar OP, Major CM, Kozma PK, Janosov MJ, Fodor BF, Agocs EA, Fried MF

Spectroscopic ellipsometry, X-ray reflectometry, VUV reflectometry, Atomic layer deposition, Ultra-thin layer

Document type Article
Journal title / Source Thin Solid Films
Peer-reviewed article 1
Volume 541
Issue Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III
Page numbers / Article number 131-135
Publisher's name Elsevier
Publisher's address (city only) Amsterdam, Netherlands
Publication date 2013-8-31
ISSN 0040-6090
DOI 10.1016/j.tsf.2012.12.091
Language English

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