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Stability of the surface passivation properties of atomic layer deposited aluminum oxide in damp heat conditions

Heikkinen I.T.S., Koutsourakis G. , Wood S., Vähänissi V., Castro F.A., Savin H.
Keywords:

Aluminium oxide, surface passivation, damp heat exposure, atomic layer deposition, degradation

Document type Proceedings
Journal title / Source AIP Conference Proceedings
Volume 2147
Issue 1
Page numbers / Article number 050003
Publisher's name AIP Publishing
Publication date 2019-8-27
Conference name SiliconPV 2019, THE 9TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS
Conference date 08-04-2019 to 10-04-2019
Conference place Leuven, Belgium
ISSN 1551-7616
DOI 10.1063/1.5123852
ISBN 978-0-7354-1892-9
Web URL https://aip.scitation.org/doi/pdf/10.1063/1.5123852?class=pdf
Language English

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Information

Project title (JRP)
16ENG03: HyMet: Hybrid metrology for thin films in energy applications
Name of Call / Funding Programme
EMPIR 2016: Energy