Using Gaussian process regression for efficient parameter reconstruction

Schneider P-I., Hammerschmidt M., Zschiedrich L., Burger S.
Keywords:

computational metrology, optical metrology, computational lithography, Bayesian optimization,machine learning, finite-element methods, nanooptics

Document type Proceedings
Journal title / Source Metrology, Inspection, and Process Control for Microlithography XXXIII
Volume 10959
Page numbers / Article number 1095911
Publisher's name SPIE
Publication date 2019-3-26
Conference name Metrology, Inspection, and Process Control for Microlithography XXXIII
Conference date 24-02-2019 to 28-02-2019
Conference place San Jose, USA
DOI 10.1117/12.2513268
Web URL https://arxiv.org/abs/1903.12128
Language English

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