Using Gaussian process regression for efficient parameter reconstruction
Schneider P-I., Hammerschmidt M., Zschiedrich L., Burger S.computational metrology, optical metrology, computational lithography, Bayesian optimization,machine learning, finite-element methods, nanooptics
| Document type | Proceedings |
| Journal title / Source | Metrology, Inspection, and Process Control for Microlithography XXXIII |
| Volume | 10959 |
| Page numbers / Article number | 1095911 |
| Publisher's name | SPIE |
| Publication date | 2019-3-26 |
| Conference name | Metrology, Inspection, and Process Control for Microlithography XXXIII |
| Conference date | 24-02-2019 to 28-02-2019 |
| Conference place | San Jose, USA |
| DOI | 10.1117/12.2513268 |
| Web URL | https://arxiv.org/abs/1903.12128 |
| Language | English |