The gateway to Europe's
integrated metrology community.

Activation of telecom emitters in silicon upon ion implantation and ns pulsed laser annealing

Andrini G., Zanelli G., Ditalia Tchernij S., Corte E., Nieto Hernández E., Verna A., Cocuzza M., Bernardi E., Virzì S., Traina P., Degiovanni I.P., Genovese M., Olivero P., Forneris J.
Keywords:

Color centers in diamond, Annealing

Document type Article
Journal title / Source Communications Materials
Volume 5
Issue 1
Publisher's name Springer Science and Business Media LLC
Publisher's address (city only) Dordrecht, GX, Netherlands
Publication date 2024-4
ISSN 2662-4443
DOI 10.1038/s43246-024-00486-4
Language English

Back to the list view