A deep etching mechanism for trenchbridging silicon nanowires
Tasdemir Z., Wollschläger N., Österle W., Leblebici Y., Erdem Alaca B.silicon nanowire, deep reactive ion etching, transmission electron microscopy, MEMS & NEMS
| Document type | Article |
| Journal title / Source | Nanotechnology |
| Peer-reviewed article | 1 |
| Volume | 27 (2016) 095303 |
| Issue | 2016 |
| Page numbers / Article number | 8 pp |
| Publisher's name | IOP Publishing Ltd. |
| Publisher's address (city only) | London |
| Publication date | 2016-2-8 |
| DOI | 10.1088/0957-4484/27/9/095303 |
| Language | English |