Project develops optical material properties for photonics and semiconductor industry

Providing the foundation for nano electronic devices, high quality sensors and photovoltaic cells

The optics and semiconductor industries use innovative materials and complex nanostructures whose optical properties are difficult to measure and often not accurately known.

Completed EMPIR project Traceable metrology of soft X-ray to IR optical constants and nanofilms for advanced manufacturing (20IND04, ATMOC) developed advanced mathematical methods to traceably characterise these materials for wavelengths ranging from soft x-ray (longer wavelength and lower energy than other x-rays) to infra-red. A database of optical constants was created, with associated uncertainties for bulk materials and ultra-thin film systems and industrially relevant datasets. This database provides the opportunity for relevant industries to run simulations and eventually develop new materials with tailored properties.

Project achievements:

Achievements from the project include:

Good practice guide: Good practice guide on traceable reflectometry, Mueller ellipsometry and scatterometry as reliable and traceable thin-film metrology technique in the soft X-ray to IR spectral range (D4)
Reference samples of ultra-thin layer systems, complex nanostructures and novel materials that are of interest to industry. These were measured using X-ray reflectivity, microreflectometry, and Mueller ellipsometry, and measurement results were presented in two reports:
- Produced and metrologically pre-characterised optical response data, test and reference samples (D2) How to calculate uncertainty budgets for scatterometry, reflectometry and Mueller ellipsometry using reference materials (D3)
Database of optical constants
Datasets associated with the project
Software package PyThia for computationally expensive models
Video on the scatterometry technique: VSL scatterometry facilities and activities - VSL This was in conjunction with EMPIR projects 20IND07 TracOptic and 20FUN02 POLight
Provided information for new standards for ellipsometry including German standards DIN 50989-5 and DIN 50989-6 as well as an international standard ISO 23131:2021
Provided information for two more standards in this area awaiting publication:
- ISO/FDIS 23131-2 - Ellipsometry — Part 2: Bulk material model
- ISO/FDIS 23131-3 - Ellipsometry — Part 3: Transparent single layer model.

Project coordinator Sebastian Heidenreich from PTB said

‘ATMOC has significantly advanced the metrology for optical material properties, supporting the development of next-generation semiconductor technologies and strengthening Europe’s position as a leader in this strategic sector.’

This EMPIR project is co-funded by the European Union's Horizon 2020 research and innovation programme and the EMPIR Participating States.

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