Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry
Petrik PP, Gumprecht TG, Nutsch AN, Roeder GR, Lemberger ML, Juhasz GJ, Polgar OP, Major CM, Kozma PK, Janosov MJ, Fodor BF, Agocs EA, Fried MFSpectroscopic ellipsometry, X-ray reflectometry, VUV reflectometry, Atomic layer deposition, Ultra-thin layer
| Document type | Article |
| Journal title / Source | Thin Solid Films |
| Peer-reviewed article | 1 |
| Volume | 541 |
| Issue | Current Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III |
| Page numbers / Article number | 131-135 |
| Publisher's name | Elsevier |
| Publisher's address (city only) | Amsterdam, Netherlands |
| Publication date | 2013-8-31 |
| ISSN | 0040-6090 |
| DOI | 10.1016/j.tsf.2012.12.091 |
| Web URL | http://www.sciencedirect.com/science/article/pii/S0040609013000175 |
| Language | English |