Light-matter interplay for optical metrology beyond the classical spatial resolution limits

Short Name: BeCOMe, Project Number: 17FUN01
Image of a blue laser in a quantum optics lab
Blue laser in a quantum optics lab

Nanoscale optical measurements with quantum optics and other techniques

Micro-nanoelectronics, nanotechnology, photonics and advanced materials have been identified by the EU as four strategically important technology sectors; their combined global market is worth € 800 billion, with photonics and micro-nanoelectronics employing more than 400,000 people in Europe.

As a measurement tool, optical systems have the advantages of speed, non-invasiveness and reliability.

However, high technology sectors are increasingly working at the nanoscale, and traditional optics-based measurement systems cannot achieve the spatial resolution required; new techniques therefore need to be developed to overcome current limitations.


This project will develop new optical measurement techniques for the investigation of structures at the nanoscale, with traceable spatial resolution beyond classical limits and sub-nanometre accuracy.

Approaches to higher resolution systems include: the development of new “metamaterial” structures; near-field methods; quantum optics techniques that exploit photon entanglement; the decoding of other information contained in optical waves.

End-user events and scientific publications will help promote the uptake of quantum-based and other innovative optics tools in high-technology sectors.


EMPIR project 20FUN02 POLight builds on this work.


Project website
Inverted plasmonic lens design for nanometrology applications

Measurement Science and Technology

Using Gaussian process regression for efficient parameter reconstruction

Metrology, Inspection, and Process Control for Microlithography XXXIII

Quantum enhanced imaging of nonuniform refractive profiles

International Journal of Quantum Information

An auxiliary field approach for computing optical resonances in dispersive media

Journal of the European Optical Society-Rapid Publications

Quantum differential ghost microscopy

Physical Review A

Sub-Wavelength Features in Spectroscopic Mueller Matrix Ellipsometry

Deutsche Gesellschaft für angewandte Optik Proceedings 2019

Other Participants
Aalto-korkeakoulusäätiö sr (Finland)
Friedrich-Schiller-Universität Jena (Germany)
Fundacio Institut de Ciencies Fotoniques (Spain)
Konrad-Zuse-Zentrum für Informationstechnik Berlin (Germany)
Swansea University (United Kingdom)
Technische Universitaet Braunschweig (Germany)
Technische Universiteit Delft (Netherlands)
Università degli Studi di Torino (Italy)