Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion

Hammerschmidt M, Weiser M, Garcia Santiago X, Zschiedrich L, Bodermann B, Burger S
Keywords:

computational metrology, optical metrology, computational lithography, nanolithography, finite-element methods, nanooptics

Document type Proceedings
Journal title / Source Proc. SPIE
Volume 10330
Page numbers / Article number 1033004
Publication date 2017
Conference name Modeling Aspects in Optical Metrology VI
Conference date 25-06-2017 to 29-06-2017
Conference place Munich
DOI 10.1117/12.2270596
Web URL https://arxiv.org/pdf/1707.08467
Language English

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