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Understanding Physico-Chemical Aspects in the Depth Profiling of Polymer:Fullerene Layers

Surana, S., Conard, T. (IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium), Fleischmann, C. (IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium), Tait, J.G., Bastos, J.P., Voroshazi, E. (IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium), Havelund, R. (NPL, National Physical Laboratory, Teddington, Middlesex, TW11 0LW, United Kingdom), Turbiez, M., Louette, P., Felten, A., Poleunis, C. (Université catholique de Louvain, BSMA, Croix du Sud 1, L7.04.01,B-1348 Louvain-la-Neuve, Belgium), Delcorte, A. (Université catholique de Louvain, BSMA, Croix du Sud 1, L7.04.01,B-1348 Louvain-la-Neuve, Belgium) and Vandervorst, W. (IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium and Instituut voor Kern- en Stralingsfysica, KU Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium)
Keywords:

ToF-SIMS, GCIB, Ar cluster, quantification, depth profiling, organics, solar cells, polymer, fullerenes

Document typeArticle
Journal title / SourceThe Journal of Physical Chemistry C
Volume120
Issue49
Page numbers / Article number28074-28082
Publisher's nameAmerican Chemical Society (ACS)
Publisher's address (city only)CAS, a division of the American Chemical Society 2540 Olentangy River Road Columbus Ohio 43210 United States
Publication date 2016-12
ISSN1932-7447, 1932-7455
DOI10.1021/acs.jpcc.6b09911
LanguageEnglish

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