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Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials

Shard, A.G. (National Physical Laboratory, Teddington, TW11 0LW, United Kingdom), Havelund, R. (NPL, National Physical Laboratory, Teddington, Middlesex, TW11 0LW, United Kingdom), Seah, M.P. (National Physical Laboratory, Teddington, TW11 0LW, United Kingdom) and CLIFFORD, C.
Keywords:

ISO, standard, SIMS, sputtering, yield volumes

Document typeArticle
Journal title / SourceSurface and Interface Analysis
Publisher's nameWiley
Publication date 2019-07-15
ISSN0142-2421, 1096-9918
DOI10.1002/sia.6686
Web URLhttps://doi.org/10.1002/sia.6686
LanguageEnglish

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