Influence of block copolymer feature size on reactive ion etching pattern transfer into silicon
Dialameh M., Ferrarese Lupi F., Imbraguglio D., Zanenga F., Lamperti A., Martella D., Seguini G., Perego M., Rossi A.M., De Leo N., Boarino L.block copolymers, reactive ion etching, self-assembly, cryogenic RIE, holey silicon
| Document type | Article |
| Journal title / Source | Nanotechnology |
| Volume | 28 |
| Issue | 40 |
| Page numbers / Article number | 404001 |
| Publisher's name | IOP Publishing |
| Publication date | 2017-9-12 |
| ISSN | 0957-4484, 1361-6528 |
| DOI | 10.1088/1361-6528/aa8144 |
| Web URL | http://iopscience.iop.org/article/10.1088/1361-6528/aa8144 |
| Language | English |