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AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure

Salmi, E., Castro, F.A., Vähänissi, V. (Aalto University, Espoo, Finland), Wood, S., Virtanen, S., Yli-Koski, M., Koutsourakis, G., Heikkinen, I.T.S. and Savin, H. (Aalto University, Espoo, Finland)
Keywords:

Spatial Atomic Layer Deposition, aluminum oxide, surface passivation, light soaking, damp heat

Document typeArticle
Journal title / SourceJournal of Vacuum Science & Technology A
Volume38
Issue2
Page numbers / Article number022401
Publisher's nameAmerican Vacuum Society
Publication date 2020-03
ISSN0734-2101, 1520-8559
DOI10.1116/1.5133896
LanguageEnglish

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