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AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure

Heikkinen, I.T.S., Koutsourakis, G., Virtanen, S., Yli-Koski, M., Wood, S., Vähänissi, V. (Aalto University, Espoo, Finland), Salmi, E., Castro, F.A. and Savin, H. (Aalto University, Espoo, Finland)

Spatial Atomic Layer Deposition, aluminum oxide, surface passivation, light soaking, damp heat

Document typeArticle
Journal title / SourceJournal of Vacuum Science & Technology A
Page numbers / Article number022401
Publisher's nameAmerican Vacuum Society
Publication date 2020-03
ISSN0734-2101, 1520-8559

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