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Impact of Line Edge Roughness on ReRAM Uniformity and Scaling

Constantoudis, V., Papavieros, G., Karakolis, P., Khiat, A., Prodromakis, T. and Dimitrakis, P.
Keywords:

Resistive Random Access Memory (ReRAM); Line Edge Roughness (LER); variability; uniformity; modeling; lithography

Document typeArticle
Journal title / SourceMaterials
Volume12
Issue23
Page numbers / Article number3972
Publisher's nameMDPI AG
Publication date 2019-11
ISSN1996-1944
DOI10.3390/ma12233972
LanguageEnglish

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