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Mueller matrix ellipsometry for enhanced optical form metrology of sub-lambda structures

Käseberg, T., Dickmann, J., Siefke, T., Wurm, M., Kroker, S. and Bodermann, B.
Keywords:

Plasmonics, Ellipsometry, Scanning electron microscopy, Numerical simulations, Metrology, Nanostructures, Near field optics

Document typeProceeding
Journal title / SourceModeling Aspects in Optical Metrology VII
Volume11057
Page numbers / Article number155-165
Publisher's nameSPIE
Publication date 2019-06-21
Conference nameInternational Society for Optics and Photonics Optical Metrology
Conference date24-06-2019 to 27-06-2019
Conference placeMunich
DOI10.1117/12.2527419
LanguageEnglish

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