Quantum anomalous Hall effect for metrology
Huáng N., Boland J., Fijalkowski K., Gould C., Hesjedal T., Kazakova O., Kumar S., Scherer H.Quantum anomalous Hall effect, Primary resistance standards, Quantum electrical metrology, Magnetic properties, Electronic transport, Quantum Hall effect, Topological insulator, Metrology, Scanning probe microscopy, Thin film growth,
| Document type | Article |
| Journal title / Source | Applied Physics Letters |
| Volume | 126 |
| Issue | 4 |
| Page numbers / Article number | 040501 |
| Publisher's name | AIP Publishing |
| Publisher's address (city only) | Melville, NY, United States |
| Publication date | 2025-1-27 |
| ISSN | 0003-6951, 1077-3118 |
| DOI | 10.48550/arXiv.2501.07712 |
| Web URL | https://doi.org/10.48550/arXiv.2501.07712 (accepted version on a public repository) |
| Language | English |