A microscopy approach for in situ inspection of micro-coordinate measurement machine styli for contamination
Feng, X. (Max Planck Institute for Polymer Research, Germany), Pascal, J. and Feng, X. (Max Planck Institute for Polymer Research, Germany)µCMM, stylus inspection, contamination, microscopy, focus stacking
| Document type | Article |
| Journal title / Source | Measurement Science and Technology |
| Volume | 28 |
| Issue | 9 |
| Page numbers / Article number | 095010 |
| Publisher's name | IOP Publishing |
| Publication date | 2017-08-21 |
| ISSN | 0957-0233, 1361-6501 |
| DOI | 10.1088/1361-6501/aa7c93 |
| Language | English |