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A microscopy approach for in situ inspection of micro-coordinate measurement machine styli for contamination

Feng, X. (Max Planck Institute for Polymer Research, Germany), Pascal, J. and Feng, X. (Max Planck Institute for Polymer Research, Germany)
Keywords:

µCMM, stylus inspection, contamination, microscopy, focus stacking

Document typeArticle
Journal title / SourceMeasurement Science and Technology
Volume28
Issue9
Page numbers / Article number095010
Publisher's nameIOP Publishing
Publication date 2017-08-21
ISSN0957-0233, 1361-6501
DOI10.1088/1361-6501/aa7c93
LanguageEnglish

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