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On the characterization of ultra-precise X-ray optical components: advances and challenges inex situmetrology

Falkenberg, G., Störmer, M., Zeschke, T., Buchheim, J., Siewert, F. and Sankari, R.
Keywords:

synchrotron optics; X-ray optics; metrology for synchrotron optics; slope measurement; NOM; multilayer; focusing mirrors

Document typeArticle
Journal title / SourceJournal of Synchrotron Radiation
Volume21
Issue5
Page numbers / Article number968-975
Publisher's nameInternational Union of Crystallography (IUCr)
Publication date 2014-08-27
ISSN1600-5775
DOI10.1107/S1600577514016221
LanguageEnglish

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