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Stability of the surface passivation properties of atomic layer deposited aluminum oxide in damp heat conditions

Heikkinen, I.T.S., Koutsourakis, G., Wood, S., Vähänissi, V. (Aalto University, Espoo, Finland), Castro, F.A. and Savin, H. (Aalto University, Espoo, Finland)
Keywords:

Aluminium oxide, surface passivation, damp heat exposure, atomic layer deposition, degradation

Document typeProceeding
Journal title / SourceAIP Conference Proceedings
Volume2147
Issue1
Page numbers / Article number050003
Publisher's nameAIP Publishing
Publication date 2019-08-27
Conference nameSiliconPV 2019, THE 9TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS
Conference date08-04-2019 to 10-04-2019
Conference placeLeuven, Belgium
ISSN1551-7616
DOI10.1063/1.5123852
ISBN978-0-7354-1892-9
Web URLhttps://aip.scitation.org/doi/pdf/10.1063/1.5123852?class=pdf
LanguageEnglish

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