Stability of the surface passivation properties of atomic layer deposited aluminum oxide in damp heat conditions
Heikkinen I.T.S., Koutsourakis G. , Wood S., Vähänissi V., Castro F.A., Savin H.Aluminium oxide, surface passivation, damp heat exposure, atomic layer deposition, degradation
Document type | Proceedings |
Journal title / Source | AIP Conference Proceedings |
Volume | 2147 |
Issue | 1 |
Page numbers / Article number | 050003 |
Publisher's name | AIP Publishing |
Publication date | 2019-8-27 |
Conference name | SiliconPV 2019, THE 9TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS |
Conference date | 08-04-2019 to 10-04-2019 |
Conference place | Leuven, Belgium |
ISSN | 1551-7616 |
DOI | 10.1063/1.5123852 |
ISBN | 978-0-7354-1892-9 |
Web URL | https://aip.scitation.org/doi/pdf/10.1063/1.5123852?class=pdf |
Language | English |