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Using Gaussian process regression for efficient parameter reconstruction

Schneider, P-I., Hammerschmidt, M., Zschiedrich, L. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany) and Burger, S.
Keywords:

computational metrology, optical metrology, computational lithography, Bayesian optimization,machine learning, finite-element methods, nanooptics

Document typeProceeding
Journal title / SourceMetrology, Inspection, and Process Control for Microlithography XXXIII
Volume10959
Page numbers / Article number1095911
Publisher's nameSPIE
Publication date 2019-03-26
Conference nameMetrology, Inspection, and Process Control for Microlithography XXXIII
Conference date24-02-2019 to 28-02-2019
Conference placeSan Jose, USA
DOI10.1117/12.2513268
Web URLhttps://arxiv.org/abs/1903.12128
LanguageEnglish

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