First steps towards a scatterometry reference standard
Bodermann, B., Hansen, P.-E., Burger, S., Henn, M.-A., Gross, H., Bär, M., Scholze, F., Endres, J. and Wurm, M.Scatterometry, CD metrology, traceability, reference standard, tool matching, AFM, SEM, rigorous modelling
| Document type | Proceeding |
| Journal title / Source | Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI |
| Volume | 8466 |
| Publication date | 2012-10-25 |
| Conference name | SPIE Optics & Photonics 2012 international meeting, conference: Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI |
| Conference date | 12-16 August 2012 |
| Conference place | San Diego, USA |
| DOI | 10.1117/12.929903 |
| ISBN | 978-0-8194-9183-1 |
| Web URL | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1379467 |