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First steps towards a scatterometry reference standard

Bodermann, B., Hansen, P.-E., Burger, S., Henn, M.-A., Gross, H., Bär, M., Scholze, F., Endres, J. and Wurm, M.
Keywords:

Scatterometry, CD metrology, traceability, reference standard, tool matching, AFM, SEM, rigorous modelling

Document typeProceeding
Journal title / SourceInstrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
Volume8466
Publication date 2012-10-25
Conference nameSPIE Optics & Photonics 2012 international meeting, conference: Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
Conference date12-16 August 2012
Conference placeSan Diego, USA
DOI10.1117/12.929903
ISBN978-0-8194-9183-1
Web URLhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1379467

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