Joint Research on Scatterometry and AFM Wafer Metrology

Bodermann B., Buhr E., Danzebrink H.-U., Bär M., Scholze F., Krumrey M., Wurm M., Klapetek P., Hansen P.-E., Korpelainen V., van Veghel M., Yacoot A., Siitonen S., El Gawhary O., Burger S., Saastamoinen T.
Keywords:

Scatterometry, CD metrology, AFM, reference standard, rigorous modelling, inverse diffraction problem

Document type Proceedings
Journal title / Source AIP Conference Proceedings
Volume 1395
Issue 319 (2011)
Publisher's name American Institute of Physics
Publication date 2011-11-10
Conference name International Conference on Frontiers of Characterisation and Metrology for Nanoelectronics FCMN 2011
Conference date 23-26 May 2011
Conference place Grenoble, France
DOI 10.1063/1.3657910
Language English

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