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Characterization of Semiconductor Materials using Synchrotron Radiation-based Near-Field Infrared Microscopy and nano-FTIR Spectroscopy

Hermann, PH (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany), Hoehl, AH (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany), Ulrich, GU (Physikalische und Theoretische Chemie, Institut für Chemie und Biochemie, Freie Universität Berlin, Takustraße 3, 14195 Berlin, Germany), Fleischmann, CF (Imec, Kapeldreef 75, 3001 Leuven, Belgium), Hermelink, AH (Robert Koch-Institut, Seestraße 10, 13353 Berlin, Germany), Kästner, BK (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany), Patoka, PP (Physikalische und Theoretische Chemie, Institut für Chemie und Biochemie, Freie Universität Berlin, Takustraße 3, 14195 Berlin, Germany), Hornemann, AH (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany), Beckhoff, BB (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany), Rühl, ER (Physikalische und Theoretische Chemie, Institut für Chemie und Biochemie, Freie Universität Berlin, Takustraße 3, 14195 Berlin, Germany) and Ulm, GU (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany)
Keywords:

Instrumentation, measurement, and metrology, Near-field microscopy, Optics at surfaces, Spectroscopy, Thin films, optical properties

Document typeArticle
Journal title / SourceOptics Express
Peer-reviewed articleYes
Volume22
Issue15
Page numbers / Article number17948-17958
Publisher's nameOptical Society of America (OSA)
Publisher's address (city only)Washington
Publication date 2014
ISSN1094-4087
DOI10.1364/OE.22.017948
Web URLhttps://www.osapublishing.org/oe/abstract.cfm?uri=oe-22-15-17948
LanguageEnglish

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