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Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and Tilting-AFM

Gaoliang, D. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Hahm, K. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Scholze, F. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Henn, M.-A. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Gross, H. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Fluegge, J. (Physikalisch-Technische Bundesanstalt Braunschweig and Berlin, Bundesallee 100, D- 38116, Braunschweig, Germany) and Bosse, H. (Physikalisch-Technische Bundesanstalt Braunschweig and Berlin, Bundesallee 100, D- 38116, Braunschweig, Germany)
Keywords:

EUV-lithography, photomask, CD, sidewall angle, feature height, CD-AFM, Tilting-AFM, scatterometry, traceability

Document typeArticle
Journal title / SourceMeas. Sci. Technol.
Peer-reviewed articleYes
Volume25
Publication date 2014-03-5
DOI10.1088/0957-0233/25/4/044002
Web URLhttp://iopscience.iop.org/0957-0233/25/4/044002
LanguageEnglish

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