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The effect of line roughness on DUV scatterometry.

Henn, M.-A. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Heidenreich, S. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Groß, H. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Bodermann, B. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany) and Baer, M. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany)
Keywords:

Scatterometry, Optical metrology, Line edge roughness

Document typeProceeding
Journal title / SourceProc SPIE
Volume8789
Publication date 2015
Conference nameSPIE Modelling Aspects in Optical Metrology IV
Conference dateMay 13, 2013
Conference placeMunich, Germany
DOI10.1117/12.2020761
LanguageEnglish

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