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Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle

Soltwisch, V. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Burger, S. (Zuse Institute Berlin (ZIB), Takustrasse 7, D- 14 195 Berlin, Germany; JCMwave GmbH, Bolivarallee 22, D-14 050 Berlin, Germany) and Scholze, F. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany)
Keywords:

EUV scatterometry, horizontal and vertical di raction, optical metrology, computational lithography, finite-element methods

Document typeProceeding
Journal title / SourceProc SPIE
Volume8789
Publication date 2015
Conference nameSPIE Modelling Aspects in Optical Metrology IV
Conference dateMay 13, 2013
Conference placeMunich, Germany
DOI10.1117/12.2020487
LanguageEnglish

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